Producción CyT
Congreso
Autoría
Julieta Puig
;
Ileana A. Zucchi
;
Roberto J. J. Williams
;
SCHROEDER, WALTER FABIAN
Fecha
2016
Editorial y Lugar de Edición
Frontiers in Physical Sciences
Resumen
Información suministrada por el agente en
SIGEVA
This work shows the formation of vesicles in an epoxy matrix as the result of polymerization-induced self-assembly (PISA). A PEB-PEO block copolymer was selected for this study because PEO is an epoxy-philic block which is completely miscible with the epoxy monomer before and after curing reaction, whereas PEB is an epoxy-phobic block. Under these conditions, micellar nanostructures with PEB core are initially formed. During the course of photopolymerization at room temperature, the self-assemb...
This work shows the formation of vesicles in an epoxy matrix as the result of polymerization-induced self-assembly (PISA). A PEB-PEO block copolymer was selected for this study because PEO is an epoxy-philic block which is completely miscible with the epoxy monomer before and after curing reaction, whereas PEB is an epoxy-phobic block. Under these conditions, micellar nanostructures with PEB core are initially formed. During the course of photopolymerization at room temperature, the self-assembled morphology changes from micelles to vesicles. To investigate the evolution of the morphology during the photocured reaction, in situ SAXS measurements were carried out.
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Palabras Clave
SELF-ASSEMBLYBLOCK COPOLYMERSEPOXYNANOSTRUCTURED THERMOSETS