Science and Technology Production
Congress
Authorship
Julieta Puig
;
Ileana A. Zucchi
;
Roberto J. J. Williams
;
SCHROEDER, WALTER FABIAN
Date
2016
Publishing House and Editing Place
Frontiers in Physical Sciences
Summary
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SIGEVA
This work shows the formation of vesicles in an epoxy matrix as the result of polymerization-induced self-assembly (PISA). A PEB-PEO block copolymer was selected for this study because PEO is an epoxy-philic block which is completely miscible with the epoxy monomer before and after curing reaction, whereas PEB is an epoxy-phobic block. Under these conditions, micellar nanostructures with PEB core are initially formed. During the course of photopolymerization at room temperature, the self-assemb...
This work shows the formation of vesicles in an epoxy matrix as the result of polymerization-induced self-assembly (PISA). A PEB-PEO block copolymer was selected for this study because PEO is an epoxy-philic block which is completely miscible with the epoxy monomer before and after curing reaction, whereas PEB is an epoxy-phobic block. Under these conditions, micellar nanostructures with PEB core are initially formed. During the course of photopolymerization at room temperature, the self-assembled morphology changes from micelles to vesicles. To investigate the evolution of the morphology during the photocured reaction, in situ SAXS measurements were carried out.
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Key Words
SELF-ASSEMBLYBLOCK COPOLYMERSEPOXYNANOSTRUCTURED THERMOSETS